Model

TCH-5S

Input Power

AC 220V, 50/60 Hz

RF Power

0-300W 

RF frequency

40KHz 

Frequency offset

Less than 0.2KHz

Control Panel

Control Function: Clean time, RF Power, Vacuum Pump

Process Control

MCU Automatic and manual mode

Plasma Chamber

Φ150mm×270mm, 5 Liter Capacity

Chamber material

Stainless steel

Characteristic impedance

50 Ohm,Automatic matching

Vacuum degree

10Pa -1000Pa

Cleaning time

1 to 100 minutes( adjustable)

Flow rate

60—600ml/min(adjustable)

Inert Gas

Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package)

Optional
 

Combinations of plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases.

Vacuum chamber temp.

Less than 65°C

Cooling type

Forced cooling

Dimensions

400x450x250

Net Weight

  37kg

Warranty

One year limited warranty with lifetime support