Model

TCH-10S

Voltage

AC 220V, 50/60 Hz

RF power

 0-300W adjustable

RF frequency

40KHZ

Frequency offset

Less than 0.2KHz

Control Panel

Control Function: Clean time, RF Power, Vacuum Pump

Process Control

MCU Automatic and manual mode

Plasma Chamber

220 ×280×180mm

10 Liter Capacity

Chamber material

Stainless steel

Characteristic impedance

50 Ohm,Automatic matching

Vacuum degree

10Pa -30Pa

Cleaning time

1 to 99999 seconds( adjustable)

Flow rate

10—300ml/min(adjustable)

Inert Gas

Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package)

Optional
 

1. Combinations of plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases.

2. Vacuum pump with extra cost of USD 420

Vacuum chamber temp.

Less than 30°C

Cooling type:

Forced cooling

Dimensions

650 ×550×440mm

Warranty

One year limited warranty with lifetime support