|
Model |
TCH-5S-RF |
|
Input Power |
AC 220V, 50/60 Hz |
|
Working current |
No more than 1.2A ( not include the vacuum pump) |
|
RF power |
0-300W adjustable |
|
RF frequency |
13.56 MHz |
|
Frequency offset |
Less than 0.2KHz |
|
Control Panel |
Control Function: Clean time, RF Power, Vacuum Pump |
|
Process Control |
MCU Automatic and manual mode |
|
Plasma Chamber |
Φ150mm×270mm stainless steel chamber 5 Liter Capacity |
|
Characteristic impedance |
50 Ohm,Automatic matching |
|
Vacuum degree |
1Pa -30Pa |
|
Vacuum pump |
2XZ-4 |
|
Cleaning time |
1 to 100 minutes ( adjustable) |
|
Flow rate |
10—160ml/min(adjustable) |
|
Inert Gas |
Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package) |
|
Gas channel no. |
Two channel gas mixer |
|
Vacuum chamber temperature |
Less than 30°C |
|
Cooling type: |
Forced air cooling |
|
Dimensions |
560x540x550mm |
|
Net Weight |
45kg |
|
Warranty |
One year limited warranty with lifetime support |
